惉枌憰抲丄僫僲壛岺憰抲

乽挻崅恀嬻MBE仌儅僌僱僩儘儞僗僷僢僞憰抲乿
MBE & Sputtering machine with ultra high vacuume

挻崅恀嬻暘巕慄價乕儉僄僺僞僉僔乕乮MBE乯偱嶌惉偟偨帋椏傪挻崅恀嬻傪曐偭偨傑傑恀嬻傪攋傜偢偵挻崅恀嬻儅僌僱僩儘儞僗僷僢僞憰抲偵堏摦偟偰楢懕惢枌偡傞偙偲偑偱偒傑偡丅MBE偺僜乕僗偼5庬椶丄僗僷僢僞憰抲偺僞乕僎僢僩偼7庬椶乮RF3嬌丄DC3嬌乯偱偁傝丄嵟戝12庬椶偺惉枌偑壜擻偱偡丅偝傜偵岎屳惉枌傕偱偒傞偨傔尨巕憌儗儀儖偱偺儅僥儕傾儖僨僓僀儞偑壜擻偱偡丅傑偨丄帋椏傪擖傟傞儘乕僪儘僢僋幒偵偼5枃偺婎斅傪巇崬傓偙偲偑偱偒傞偨傔丄恀嬻傪攋傞偙偲側偔5庬椶偺楢懕惉枌偑壜擻偱偡丅偝傜偵丄憰抲撪偵偼斀幩崅懍揹巕慄夞愜憰抲乮RHEED乯傕忢愝偝傟偰偄傞偨傔丄惉枌拞偺寢徎惉挿忬懺傪偦偺応娤嶡偡傞偙偲傕壜擻偱偡丅岝僨傿僗僋傗HDD偺婰榐枌丄塼徎僥儗價傗懢梲揹抮偺揹嬌側偳傎偲傫偳偺惉枌媄弍偵偼僗僷僢僞偑梡偄傜傟偰偄傞偨傔丄偙偺廗摼偼戝愗丅

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乽挻崅恀嬻僀僆儞價乕儉僗僷僢僞憰抲仌Ar僀僆儞僄僢僠儞僌憰抲乿Ion beam sputtering machine with Ar ion etching

儅僌僱僩儘儞僗僷僢僞偼帋椏偑僾儔僘儅偵嶯偝傟傞偨傔丄Ar僈僗崿擖傗揹巕偺夁忚怤擖偵傛傞枌幙楎壔偑栤戣偲側傝傑偡偑丄偙傟傪夞旔偡傞偨傔偵偼僾儔僘儅僼儕乕偺僗僷僢僞偑昁梫偱丄偦傟偑僀僆儞價乕儉僗僷僢僞偱偡丅惉枌幒偲棧傟偨応強偱僾儔僘儅傪宍惉偟丄僀僆儞壔偟偨僈僗傪揹奅偱帋椏婎斅偵桿摫懲愊偡傞惉枌曽朄偱偡丅偙偙偵傕RHEED偑偮偄偰偍傝丄惉枌拞偺寢徎忬懺傪偦偺応娤嶡偡傞偙偲偑偱偒傑偡丅傑偨丄偙偺僾儔僘儅敪惗偵偼儅僀僋儘攇傪梡偄偰偍傝枾搙偺崅偄鉱枾側惉枌偑壜擻偱偡丅摨條偺儅僀僋儘攇尮偼婎斅懁偵傕偮偄偰偍傝丄婎斅懁傪Ar僄僢僠儞僌偡傞偙偲傕偱偒傑偡丅側偍丄僞乕僎僢僩偼4庬椶僙僢僩偱偒傞偨傔4庬椶偺楢懕惢枌偑壜擻偱偡丅

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乽揹巕慄昤夋憰抲晅偒崅暘夝擻FE-SEM乮JEOL6500F)乿
SEM with electron beam lithography

崅暘夝擻昞柺娤嶡偑壜擻偲側傞揹奅曻弌宆憱嵏揹巕尠旝嬀乮FE-SEM 壛懍揹埑30倠V乯偱徻嵶側昞柺娤嶡偑偱偒傞丅傑偨丄偙傟偵偼搶嫗僥僋僲儘僕乕幮惢偺揹巕慄昤夋憰抲(Beam Draw)偑憹愝偟偰偁傝丄慄暆100nm慜屻偺揹巕慄昤夋偑壜擻偱偁傞丅婎斅傪僗僺僫乕偵僙僢僩偟揹巕慄昤夋梡儗僕僗僩傪揾晍偟丄杮憰抲偵偰擟堄偺僷僞乕儞傪宍惉偟丄偙偺忋偵慜弎儅僌僱僩儘儞僗僷僢僞憰抲偱惉枌丄儕僼僩僆僼僾儘僙僗偱帴惈嵶慄傪摼傞丅偙偺堦楢偺幚尡傪尋媶幒撪偱夞偡偙偲偑偱偒傞丅

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乽廤懇僀僆儞價乕儉憰抲(FIB 擔棫FB-2000A)乿

擔棫惢廤懇僀僆儞價乕儉憰抲偱偼Ga僀僆儞價乕儉傪嶌惉偟丄暋嶨側宍忬傪偟偨帋椏偺抐柺傪敄曅壔偟偰TEM偁傞偄偼SEM偺娤嶡帋椏傪壛岺偡傞偙偲偑偱偒傞丅傑偨丄偦偺惛搙偺崅偝偐傜嶌惉偟偨帴惈嵶慄傪嬊強揑偵曗懌偟偨傝丄帴暻偺僺儞僯儞僌僒僀僩傪嶌惉偡傞偙偲傕偱偒傞丅偙偺傎偐丄帴惈検巕僪僢僩偺嶌惉傗Ga僀僆儞懪偪崬傒岠壥傪棙梡偟偨僫僲儊乕僞僒僀僘偺旝彫帴愇傕嶌傞偙偲偑偱偒傞丅偙傟傪棙梡偟偰DNA傗惗懱暔幙傪儅僀僋儘棳楬偱憖嶌偡傞嵺丄擟堄偺応強偵嬊強帴奅傪徠幩偡傞偙偲傕偱偒傞丅傑偨丄儊僞儅僥儕傾儖嵽椏壛岺偵傕巊偊傞偨傔僗僺儞懢梲揹抮側偳條乆側傾僀僨傾傪帋偡偙偲偑偱偒傞丅


丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂

丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂乽僫僲僀儞僾儕儞僩(Nano-imprint) 憰抲乿

丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂嵟戝壏搙俆侽侽亷偺恀嬻擬僾儗僗壜擻側僫僲僀儞僾儕儞僩憰抲
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂儚乕僋偲僗僞儞僷娫偺僄傾傪恀嬻攔婥偱偒傞偨傔丄椙岲側
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂僫僲僀儞僾儕儞僩婎斅傪嶌惉偱偒傞丅

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娤嶡憰抲丄昡壙憰抲

丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂乽俿俵俼僿僢僪傪梡偄偨僫僲帴嬫娤嶡憰抲乿
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂乮Nano magnetic microscopy with TMR head乯乿

丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂30nm x 30nm偺TMR僿僢僪傪倃倄僗僉儍儞偡傞偙偲偱丄
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂崅暘夝擻側帴嬫娤嶡偑壜擻丅應掕偺帪娫暘夝擻傕700俵俫倸偲丂丂
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂崅偄丅俙俥俵怣崋偑廳忯偡傞MFM偲堎側傝丄帴壔忣曬偩偗偺
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂僟僀儗僋僩應掕偑偱偒傞丅傑偨丄50nm x 50nm偺悅捈帴婥
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂婰榐僿僢僪傕搵嵹偟偰偍傝丄嵟戝侾俿丄婰榐廃攇悢傕俧俫倸
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂傑偱懳墳丅峏偵丄20nm x 120nm偺掞峈慺巕傕搵嵹偟偰偍傝丄
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂帋椏捠揹偵傛傞崅暘夝擻側擬暘晍偺僀儊乕僕傗擬儗僗億儞僗偺
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂應掕傕壜擻丅丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂

丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂乽尨巕娫椡尠旝嬀媦傃帴婥椡尠旝嬀乿(MFM)

丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂嵶偄扵恓傪帋椏昞柺偵嬤偯偗傞偲尨巕娫椡偑媫寖偵嫮偔側傞丅
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂偙偺扵恓傪帋椏昞柺偵嬤偯偗偰尨巕娫椡偑堦掕偵側傞傛偆偵
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂僗僉儍儞偡傞偲尨巕娫椡偺昞柺僀儊乕僕傪摼傞偙偲偑偱偒傞丅
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂偙傟偼尨巕僆乕僟乕偱偺墯撌宍忬傪娤嶡偡傞偙偲偑偱偒傞偺偱
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂尨巕娫椡尠旝嬀(Atomic Force Microscopy : AFM)偲屇偽傟偰偄傞丅
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂摨條偵扵恓昞柺偵帴惈枌傪宍惉偡傞偲丄帋椏昞柺偺帴婥椡偲偺
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂憡屳嶌梡僀儊乕僕傪摼傞偙偲偑偱偒傞丅偙傟偼帴婥椡尠旝嬀
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂(Magnetic ForceMicroscopy:MFM)偲屇偽傟偰偄傞丅嬻娫暘夝擻偼
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂30nm偲崅偔丄帴暻堏摦忬懺傪徻嵶偵挷傋傞偙偲偑偱偒傞丅

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丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂乽揹帴愇媦傃惵怓儗乕僓乕徠幩壜擻側崅暘夝擻曃岝尠旝嬀乿
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂Polar Kerr microscope with bleu laser irradiation

丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂悈嬧儔儞僾丄100攞懳暔儗儞僘丄桘怹偺慻傒崌傢偣偱暘夝擻偼200nm
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂慜屻偱偁傞丅娤嶡岝偲摨幉忋偵惵怓儗乕僓乕傪徠幩偱偒傞傛偆偵側偭偰
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂偍傝丄岝帴婥婰榐偝傜偵摨堦儗乕僓乕岝偱帋椏嬊晹偺嬌Kerr岠壥傪昡壙
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂偡傞偙偲傕偱偒傞丅報壛壜擻側帴奅嫮搙偼侾T偱偁傝丄帴惈帋椏偺嬊強
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂僸僗僥儕僔僗儖乕僾應掕傗帋椏偺拝帴丄斀揮帴嬫憸側偳傪挷傋傞偙偲傕
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂偱偒傞丅傑偨丄桘怹偺応崌偵偼儗儞僘偲帋椏偺娫偺嬻寗偑侾倣倣掱搙偲
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂嬤偔丄揹嬌晅偗偑擄偟偔側傞偑丄50攞偺懳暔儗儞僘傪巊偆偲嬻寗偼
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂侾侽倣倣偲峀偔側傞丅揹棳尮偵偼Pico second幮偺抁僷儖僗揹尮 (棫忋
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂傝丄棫壓傝帪娫偼30psec,丂壜曄僷儖僗暆1乣100nsec)偱崅掞峈側帴惈
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂嵶慄偵傕僷儖僗揹棳傪擖幩偱偒傞丅怣崋偺崅懍儗僗億儞僗偼懷堟俀GH倸
丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂偺僨僕僞儖僆僔儘傪棙梡偡傞偙偲偑偱偒傞丅

乽岎斣帴奅宆帴椡宆崅姶搙帴椡寁
(AGFM Alternative Gradient Force Magnetometer)乿
Co 傢偢偐1 尨巕憌偱傕帴壔應掕偑偱偒傞崅姶搙帴椡寁偱偁傞丅
應掕姶搙偼 10^-6 emu丅 偟偐傕帋椏曅偺戝偒偝偼傢偢偐俁倣倣
妏偱傛偄丅嵟戝報壛帴奅偼俀T偱偁傞偑丄帴奅偺崅懍僗僀乕僾偑
壜擻側偨傔 1 儖乕僾應掕帪娫偼 1 暘掱搙偲抁偔偡傞偙偲傕偱偒傞丅
應掕僾儘乕僽偼嬌嵶偺僈儔僗慄偱偁傞偨傔偙偺崅姶搙應掕傪壜擻偵
偡傞偑丄帋椏岎姺帪偵愜傟傗偡偄偺偱拲堄偑昁梫偱偁傞丅







乽儗乕僓乕岝尮嬌僇乕岠壥僸僗僥儕僔僗儖乕僾僩儗乕僒乕 乿
乮Hall岠壥應掕偵傕棙梡乯
Co 傢偢偐1 尨巕憌偱傕嬌僇乕帴婥岝妛岠壥偑應掕偱偒傞傎偳崅姶搙側
應掕婍偱偁傞丅岝尮偵偼650nm愒怓儗乕僓乕傪梡偄偰偍傝報壛壜擻側
奜晹帴奅偼1.4T偱偁傞丅1儖乕僾偺應掕偵偼5暘傎偳偱偁傝丄AGFM偲
堎側傝帋椏偼帋椏戜偵偺偣傞偩偗偱傛偄丅帴婥岝妛岠壥偼帴惈懱撪偺
揹巕忬懺枾搙偺僗僺儞暘嬌忬懺偐傜惗偠傞偨傔丄僼僃儖儈柺傛傝傕悢
eV崅偄椞堟偺傾僢僾僗僺儞偲僟僂儞僗僺儞偺嵎傪抦傞偙偲偑偱偒傞丅
偙偺攇挿埶懚惈傪185nm乣愒奜傑偱應掕偱偒傞憰抲乮僩儓僞儅僢僋僗
惢乯傕棙梡偱偒傞丅堦曽丄杮憰抲偱hall岠壥傪應掕偡傞偙偲傕偱偒傞丅
偙傟偼僼僃儖儈柺晅嬤偺僗僺儞暘嬌偵懳墳偟偰偄傞偨傔僇乕岠壥應掕婍偲
hall岠壥應掕婍偺寢壥偐傜峀僄僱儖僊斖埻偱僗僺儞暘嬌偺暘嶶忬懺傪
應掕偡傞偙偲偑偱偒傞丅

丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂丂

攇挿壜曄帴婥岝妛僇乕夞揮妏丄僇乕懭墌棪應掕憰抲丂丂丂丂丂丂僗僥乕僕壏搙曄峏壜擻側僄儕僾僜儊乕僞
Polar Kerr rotation, Kerr ellipticity, Reflection丂丂丂丂丂Ellipsometer with variable wavelength
with variable wavelength丂

嬌帴婥岝妛Kerr岠壥丄俲倕倰倰懭墌棪丄斀幩棪摨帪應掕偑丂丂丂擔杮暘岝惢偺僄僀僾僜儊乕僞偱帋椏僗僥乕僕偺壏搙傪
壜擻丅敀怓岝傪暘岝偡傞偙偲偵傛傝應掕攇挿偼260nm偐傜丂丂丂幒壏偐傜600亷傑偱曄偊傞偙偲偑偱偒傞丅
800nm傑偱曄峏偡傞偙偲偑偱偒傞丅報壛帴奅嫮搙偼嵟戝丂丂丂丂敀怓暘岝偵傛傝應掕攇挿傪350nm偐傜800n倣曄峏
俀俿偱丄帋椏壏搙偼塼懱拏慺壏搙偐傜200亷傑偱曄偊傞丂丂丂丂偱偒傞偨傔孅愜棪偺僗儁僋僩儖偑應掕壜擻
偙偲偑偱偒傞丅
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